Products > Semiconductor evaluation > Wafer process > GS-300
Identifying any defect or loss on a wafer immediate is a critical part of labs and manufacturers. GS-300 helps Si wafer measurement in real-time and understanding the wafer characteristics at a glance by visualizing the results in a color-coded grid.
GS-300’s measurement system is compatible with load port, it is available as a spare unit of Φ300mm EFEM port and still adopts pattern matching and X-Y motion reproducibility of 2μm or less accuracy using RθXY stage.
Compatible with the spare unit of Φ300mm EFEM port
Achieves pattern alignment of wiring patterns embedded in wafers
Responds to high throughput requirements of semiconductor process
[Operation video]
| Type | Integration mapping system |
| Stage type | RθXY stage |
| Measurement system | microscope head + IR camera |
| Max. wafer size | Φ300mm |
| Wafer angle correction function | O |
| Pattern alignment function | O |
| Wafer thickness range | SF-3 thickness sensor specification |
| Size | 500(W) x 500(D) x 1680(H)mm (monitor and keyboard are not included) |
Measured data
> Φ300mm wafer after grinding
Si film thickness distribution(approx. 771μm)
6F, 41, Seongnam-daero 925beon-gil, Bundang-gu, Seongnam-si, Gyeonggi-do, 13496, Republic of Korea
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