FILM EVALUATION

Film evaluation

Film total thickness

Si wafer thickness monitoring system SF-3 series
  • Real-time measurement of Si wafer thickness at CMP or backside grinding

  • Non-contact and non-destructive measurement available

  • Original analytical algorithm for thickness measurement (patent granted)



Film(coating) thickness

Film thickness line scanner(in-line type)
  • Inspects thickness unevenness of film using hyperspectral imaging without any drop out

  • Originally designed hardware(hyperspectral camera) and software

  • High precision measurement(patented)

  • Wide sample inspection at one time


Film thickness line scanner(offline type)
  • Inspects thickness unevenness of film and other materials using hyperspectral imaging

  • Originally designed hardware(hyperspectral camera) and software

  • High precision measurement(patented)


Array spectrometer MCPD series
  • Multipurpose spectrometer covering from UV to NIR wavelength range

  • Able to measure micro spot spectrum, light source, transmittance, reflectance, object color and thickness

  • Compact size and light weight - 60% of downsizing from previous generation



Retardation

LCD cell gap measurement RETS series
  • Polarization optical system and array spectrometer
  • Cell gap measurement for LCD cell and empty cell with color filter
  • Measures various size of samples(from 1mm optical element to 10th generation large LCD panels)

Retardation measurement system RETS-100nx
  • Measures laminated films by a non-destructive method
  • Measures exceptionally high retardation as 60,000nm with high speed and high precision
  • The axial correction function improves accuracy even for repeated sample replacement

High speed retardation measurement RE-200
  • Suitable for low retardation measurement

  • High speed measurement of retardation simultaneously with optical axis detection - the world's fastest equivalent

  • Lineup includes various wavelengths in addition to 550nm



Transmittance

Array spectrometer MCPD series
  • Multipurpose spectrometer covering from UV to NIR wavelength range

  • Able to measure micro spot spectrum, light source, transmittance, reflectance, object color and thickness

  • Compact size and light weight - 60% of downsizing from previous generation



Film total thickness

Si wafer thickness monitoring system 

SF-3 series


Film(coating) thickness

Film thickness line scanner

(in-line type)

Film thickness line scanner

(off line type)

Array spectrometer

MCPD series


Retardation

LCD cell gap measurement

RETS series

Retardation measurement system RETS-100nx

High speed retardation measurement RE-200


Transmittance

Array spectrometer

MCPD series


6F, 41, Seongnam-daero 925beon-gil, Bundang-gu, Seongnam-si, Gyeonggi-do, 13496, Republic of Korea


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