Products > Display evaluation > OLED(RGB, white), OLEDoS > IC-TM
• Optimized optical design tailored to the chamber environment, including height and tilt variations.
• Ultra-thin film thickness measurement down to a few nanometers using the UV-VIS wavelength range.
• Stable operation under very-high vacuum, even below 10⁻⁵ Pa, enabled
by low-outgassing, vacuum-compatible materials.
| Category | Part | Item | Specification |
| H/W | Probe | Working Distance (W/D) | 12~200 mm (Customizable with optical design) |
| Spectrometer | Wavelength Range | 220~850 nm | |
| Wavelength accuracy | ±0.3 nm | ||
| Resolution | 1.0nm/pixel | ||
| CCD | 512 or 1024ch | ||
| TE-Cooled CCD Image Sensor | |||
| Lamp | source | LDLS | |
| wavelength | 190~2500 nm | ||
| Lifetime | 10,000 h (14 months) | ||
| Interlock | Shutter, sensor (option) | ||
| Optical fiber | Length | 0.5~25m | |
| Material | Quartz | ||
| Vacuum | ≤10-7 Torr | ||
S/W | Measurement | Repeatability | 1) SiO2(1000Å)/Si, 1σ≤1Å |
| 2) OLED(200~1000Å), 1σ≤ 0.5Å | |||
| Tact time | Sample ≤ 0.5s | ||
Recipe | Model (Dispersion equation) | Cauchy, Tauc-Lorentz, Cody-Lorentz Drude-Lorentz, EMA mix, etc., | |
| Quantity | Max 999 | ||
| Communication | PLC, CIM, CC-LINK IE Field |
• Monitor film thickness in real time during deposition to instantly detect process anomalies and prevent defects before they occur, improving both yield and throughput simultaneously.
• Custom-designed probes optimized for various high-vacuum chamber environments, with capability to measure multiple points at once.
• Optimized optical design tailored to the chamber environment, including height and tilt variations
• Ultra-thin film thickness measurement down to a few nanometers using the UV-VIS wavelength range
• Stable operation under very-high vacuum, even below 10⁻⁵ Pa, enabled by low-outgassing, vacuum-compatible materials
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